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Sample38
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Sample38
Mode: CMPSingleSidePolishingWaferRigidPeriodicSymmetry
Pattern Symmetry - Thick Line&Space
Computational Time (PentiumIII 929MHz)
FMatrix Generation and Inversing

0 min 14 sec
Removal (1 sec x 190 CMP steps)

1 min 00 sec
Total

1 min 14 sec


Surface Profile


Pressure Distribution
Reference:
"Pattern Symmetry and CMP Process Simulation", Proc. MRS, W6.7, (2005)

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Last modified: 12/01/05