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Up
Sample01
Sample02
Sample03
Sample04
Sample05
Sample06
Sample07
Sample08
Sample09
Sample10
Sample11
Sample12
Sample13
Sample14
Sample15
Sample16
Sample17
Sample18
Sample19
Sample20
| |
| Sample01 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidWithRefPln |
 ILD Standalone Pattern, Reference Plane 12500A
 CMPxML,
CMPMode,
LayerMatrixFile, Reference Plane |
| Total Calculation Time (PentiumIII
929MHz) |
36 sec |
| Sample02 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidWithRefPln |
 ILD Standalone Pattern,
Reference Plane 17500A
CMPPadSets |
| Total Calculation Time (PentiumIII
929MHz) |
41 sec |
| Sample03 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 ILD Periodic Pattern
Periodic Pattern |
| Total Calculation Time (PentiumIII
929MHz) |
2 min 57 sec |
| Sample04 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 ILD 2-Dimensional Simulation
by Periodic Pattern
2-D as a special case of 3-D
using Periodic Mode |
| Total Calculation Time (PentiumIII
929MHz) |
20 sec |
| Sample05 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidWithRefPln |
 STI Standalone Pattern,
Reference Plane 11000A
Complicated film structure,
MaterialSets |
| Total Calculation Time (PentiumIII
929MHz) |
45 sec |
| Sample06 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 STI Periodic Pattern, Without
Reference Plane
Dishing, Errosion, Thinning |
| Total Calculation Time (PentiumIII
929MHz) |
3 min 16 sec |
| Sample07 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 STI Composite Film with Pattern
Density, Stacked Pad
Composite Film, Pattern
Density |
| Total Calculation Time (PentiumIII
929MHz) |
2 min 32 sec |
| Sample08 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 STI Composite Film with Pattern
Density, Solo Pad
Composite Film, Pattern
Density |
| Total Calculation Time (PentiumIII
929MHz) |
3 min 28 sec |
| Sample09 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidWithRefPln |
 Zoom In of STI Dram Structure,
Using Trend Data of Sample07 R2C18 for Reference Plane and Pressure
Zoom-In |
| Total Calculation Time (PentiumIII
929MHz) |
3 min 49 sec |
| Sample10 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidWithRefPln |
 Zoom In of STI Dram Structure,
Using Trend Data of Sample08 R2C18 for Reference Plane and Pressure
Zoom-In |
| Total Calculation Time (PentiumIII
929MHz) |
3 min 58 sec |
| Sample11 (more
detail) |
| Mode:
CMPSingleSidePolishingWaferRigidAxiSymmetricWithRefPln |
 AxiSymmetric Wafer Edge Performance, Stacked Pad
Wafer Scale, AxiSymmetric |
| Total Calculation Time (PentiumIII
929MHz) |
3 min 15 sec |
| Sample12 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidAxiSymmetricWithRefPlnWaferEdge |
 AxiSymmetric Wafer Edge
Performance, Stacked Pad
Wafer Edge Mode
|
| Total Calculation Time (PentiumIII
929MHz) |
3 min 15 sec |
| Sample13 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidAxiSymmetricWithRefPlnWaferEdge |
 AxiSymmetric Wafer Edge
Performance, Solo Pad
Wafer Edge Mode |
| Total Calculation Time (PentiumIII
929MHz) |
2 min 49 sec |
| Sample14 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidAxiSymmetricWithoutRefPlnWithRetainer |
 AxiSymmetric Without Reference
Plane, With Retainer
Retainer, FMatrixRead [Free FMatrix Data Available
(Please use Free FMatrix Data. If you calculate FMatrix on your own, it
will take a few hours more.)] |
| Total Calculation Time (PentiumIII
929MHz) |
41 min 59 sec
(4 Hr 11 min)
if calculate FMatrix |
| Sample15 (more
detail) |
| Mode: CMPSingleSidePolishingWaferElasticWaxPneumaticStampPeriodic |
 Nanotopography Generation by
Wafer Process using Thin Wax Mount System, Backside Nanotopography
2-Peeks and 2-Valleys Sine Curve
Wafer Elastic Deformation,
Nanotopography, Wax Mount |
| Total Calculation Time (PentiumIII
929MHz) |
11 min 10 sec |
| Sample16 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 STI Die Scale Simulation with
Composite File, Impact of Nanotopography on STI CMP
Nanotopography Impact on STI |
| Total Calculation Time (PentiumIII
929MHz) |
3 min 39 sec |
| Sample17 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 STI Simulation by Composite
Film, Pattern Density and Nanotopography with Stacked Pad
Pattern Density and
Nanotopography Impact |
| Total Calculation Time (PentiumIII
929MHz) |
2 min 31 sec |
| Sample18 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 STI Simulation by Composite
Film, Pattern Density and Nanotopography with Solo Pad
Pattern Density and
Nanotopography Impact |
| Total Calculation Time (PentiumIII
929MHz) |
3 min 35 sec |
| Sample19 Step1~3 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 Multi-Step STI Composite Film
with Pattern Density, Using Nanotopography Data of Last Step
Muti-Step Simulation |
| Total Calculation Time (PentiumIII
929MHz) |
2 min 31 sec
2 min 31 sec
2 min 31 sec |
| Sample20 Step1~2 (more
detail) |
| Mode: CMPSingleSidePolishingWaferRigidPeriodic |
 Multi-Step STI Composite Film
with Pattern Density Compensation, Using Nanotopography Data of Last
Step
Muti-Step Simulation, Effect
of Pattern Density Compensation |
| Total Calculation Time (PentiumIII
929MHz) |
2 min 31 sec
2 min 32 sec |
|
